Supported platinum nanoparticles

A High-Pressure X-ray Photoelectron Spectroscopy Study

Cover Image† Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, Aarhus University, DK-8000 Aarhus C, Denmark

‡ Department of Physics, University of Central Florida, Orlando, Florida 32816, United States

§Haldor Topsøe A/S, Nymøllevej 55, DK-2800 Kgs. Lyngby, Denmark

Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, United States

ACS Nano, 2012, 6 (12), pp 9

DOI: 10.1021/nn3040167

Section:

Abstract

The stability of Pt nanoparticles (NPs) supported on ultrathin SiO2 films on Si(111) was investigated in situ under H2 and O2 (0.5 Torr) by high-pressure X-ray photoelectron spectroscopy (HP-XPS) and ex situ by atomic force microscopy (AFM). No indication of sintering was observed up to 600 °C in both reducing and oxidizing environments for size-selected Pt NPs synthesized by inverse micelle encapsulation. However, HP-XPS revealed a competing effect of volatile PtO desorption from the Pt NPs (2 and 4 nm NP sizes) at temperatures above 450 °C in the presence of 0.5 Torr of O2. Under oxidizing conditions, the entire NPs were oxidized, although with no indication of a PtO2 phase, with XPS binding energies better matching PtO. The stability of catalytic NPs in hydrogenation and oxidation reactions is of great importance due to the strong structure sensitivity observed in a number of catalytic processes of industrial relevance.Cover Image imization of their stability, which, as it will be shown here, is strongly dependent on the reaction environment.

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